Metode til fremstilling af molybdænmål og indførelse af anvendelse
Molybdenum target preparation is typically done by melting and casting the molybdenum metal into a desired shape. The molten molybdenum is then cooled and solidified in a vacuum furnace or other controlled environment. The target is then machined to the desired shape, size, and surface finish. Molybdenum targets are widely used in several industries, including the electronics and semiconductor industries, as well as in the aerospace and automotive industries. They are often used as a substrate material for thin film deposition and as an anode for sputtering. Molybdenum targets are also used in the production of medical equipment, such as X-ray tubes. They are also used in the production of solar cells, as well as in the manufacture of optical components.Molybdenum targets have the same properties as their raw materials. Molybdenum is a silver-gray metal with a melting point of 2623°C and a density of 10.2g/cm3. Vacuum environment or inert gas protection environment, pure molybdenum has a high temperature resistance of 1200 degrees, and molybdenum alloy has a high temperature resistance of 1700 degrees. The weak oxidation of molybdenum begins at 300 °C (572 °F), and it has one of the lowest coefficients of thermal expansion of commercial metals. The molybdenum target produced is a high-purity sputtering target with the highest density and smallest average grain size for PVD, CVD, APS and VPS coating processes.
Molybdenum target characteristics
Molybdenum target shape: flat target, rotating target, special-shaped customization
Molybdenum target purity: 3N5
Molybdenum target size: processed according to drawings or customized
We can also provide molybdenum wire, molybdenum sheet, molybdenum rod, molybdenum granule, molybdenum block, molybdenum crucible, molybdenum products, molybdenum fasteners, etc.
Molybdenum target preparation process
1. The purity of molybdenum powder is greater than or equal to 99.95%. The hot pressing sintering process is used to densify the molybdenum powder, and the molybdenum powder is placed in the mold; after putting the mold into the hot pressing sintering furnace, vacuum the hot pressing sintering furnace; adjust the temperature of the hot pressing sintering furnace to 1200-1500 ℃, the pressure is greater than 20MPa, and heat preservation and pressure for 2 ~ 5h; form the first molybdenum target blank;
2. Perform hot rolling treatment on the first molybdenum target blank, heat the first molybdenum target blank to 1200-1500°C, and then perform rolling treatment to form the second molybdenum target blank;
3. After the hot rolling treatment, the second molybdenum target blank is annealed. The annealing method is to adjust the temperature to 800-1200° C., and heat the second molybdenum target blank for 2-5 hours to form a molybdenum target.
This method solves the problems of high impurity content and uneven texture distribution of molybdenum targets. The molybdenum targets prepared by this method have higher purity and density, more uniform distribution of target textures, and can form specific crystal orientation, molybdenum The sputtering performance of the target is better.
Molybdenum Target Application
Molybdenum sputtering targets can form thin films on substrates, and are widely used in electronic components and electronic products, integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices; they can also be used in the field of glass coating; It is used in wear-resistant materials, high-temperature corrosion, decorative products and other industries.
Other Applications of Molybdenum
Molybdenum material is mainly used in vacuum high temperature industry, electronics industry, sapphire thermal field and aerospace manufacturing industry, etc. After rolling and processing of molybdenum material with a deformation of more than 60%, the density of molybdenum is basically close to the theoretical density, so it has High strength, uniform internal structure and excellent high temperature creep resistance, are widely used in the production of reflective screens in sapphire crystal growth furnaces, reflective screens in cover plate vacuum furnaces, heating tapes, connectors, sputtering for plasma coating Target materials, high temperature resistant boats and other products.
Molybdenum target alloy type
In addition to molybdenum targets, we can also provide molybdenum-titanium-alloy.html>titanium alloys, molybdenum-rhenium alloys, molybdenum-niobium alloys, molybdenum-copper alloys, molybdenum-lanthanum alloys, molybdenum-tantalum alloys and other targets.
